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Two oral presentations from Unipress at ICDS-33![]() We are pleased to inform you that our colleague from laboratory NL-12, Dr. Piotr Kruszewski, will represent our Institute at the ICDS-33 conference - 33rd International Conference on Defects in Semiconductors, which will take place from September 14 to 19, 2025, in Shanghai, China. ICDS conference is one of the most prestigious international conferences dedicated to defect research in semiconductors, and the first conference of this series was initiated in 1959 in Gatlinburg, Tennessee, USA. A significant honor for our Institute is the fact that Dr. Piotr Kruszewski will deliver two oral presentations in Shanghai. The first one is focused on defect studies in AlxGa1-xN layers and is titled "On the origin of the electrically active defects E1 and E3 in GaN and dilute AlxGa1-xN films grown on Ammono-GaN substrates" while the second presentation addresses defects in gallium oxide (Ga2O3) and the influence of an electric field on the defect properties Ec-0.18 eV in crystals grown by the Czochralski method. The full title of this paper is "The electric field influence on EC-0.18 eV electron trap level in (100)-oriented β-Ga2O3 crystals grown by the Czochralski method" More information about the conference, as well as the detailed program, can be found at https://www.icds2025.org/ Public defense of the PhD dissertation of Mikołaj Chlipała, MSc Eng![]() A public defense of the doctoral dissertation of Mikołaj Chlipała, MSc Eng, will be held on 2 September 2025 (Tuesday) at 10:00 a.m. in the seminar room of the Institute of High Pressure Physics, Polish Academy of Sciences, in Warsaw, 29/37 Sokołowska St. Dissertation title: „Harnessing built-in fields in group III-nitride light emitters grown by molecular beam epitaxy” Dr inż. Artur Lachowski received SONATINA grant![]() As a result of the SONATINA 9 competition, the National Science Centre has qualified for financing the research project of dr. inż. Artur Lachowski from our Institute. The project is titled "Optimizing the epitaxial growth of niobium nitride for superconducting electronic applications" and will be realized in part in the Leibniz-Institut für Kristallzüchtung (IKZ) in Berlin, Germany. The SONATINA grant provides the funds necessary to cover all project expenses and secure the full-time employment of the PI at a Polish research centre. The PIs are also required to plan and complete a fellowship at a renowned foreign research centre of their choice. More about the SONATINA 9 competition and the results here while the project abstract is available under this link.. |
IHPP PAS Seminar on Nitride Semiconductors![]() Dear Colleagues, We are pleased to invite you to the next IHPP PAS Seminar on Nitride Semiconductors. The talk will be held in a hybrid mode – at the seminar room in New Technologies building, Al. Prymasa Tysiąclecia 98, and through Zoom platform (to get the link, please contact us at nitride_seminar@mail.unipress.waw.pl ). The talk is scheduled on Thursday 04.09.2025 at 15:00 CEST. Speaker: Dr. Tobias Schulz (Leibniz-Institut für Kristallzüchtung, Berlin, Germany) Title: Cathodoluminescence in a scanning electron microscope operated in transmission mode Abstract: Link Sincerely, Tadeusz Suski Publication in Communications Materials about Josephson junctions grown by MBE![]() Josephson junctions are building blocks of qubits in quantum computers. Researchers from MBE laboratory from our Institute just published a study in Nature Communications Materials showing an important step for the technology of their fabrication. They presented a new approach for growing thin films of superconducting niobium nitride (NbN) on GaN substrates using plasma-assisted molecular beam epitaxy (PAMBE) with indium as a surfactant. The use of indium enabled the growth of NbN thin films with quality suitable for Josephson junction applications. The study demonstrated the world's first NbN/InAlN/NbN Josephson junction fabricated using the MBE method. The junctions achieved a critical current density of 1 kA/cm². This work shows that MBE technology can be fully exploited for the integration of NbN with group III nitrides, opening the path toward a new class of devices. The full article A. Lachowski et al. NbN-based Josephson junctions grown by plasma-assisted molecular beam epitaxy Commun Mater 6, 169 (2025) is available at: https://www.nature.com/articles/s43246-025-00891-3 |
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